Analysis case: Metal content analysis in a solution
High-sensitivity analysis of various solutions, such as pure water and wafer cleaning liquids, is possible.
ICP-MS can sensitively analyze the metal content in solutions, such as the metal amounts in the cleaning solution used in the wafer cleaning process and the metal amounts in the pure water flowing through the pipes installed in the equipment and buildings. It can accommodate various types of solutions, including pure water, acids, and alkalis, and can analyze metal element concentrations ranging from ppt levels to major component levels. This document presents case studies investigating the metal content in commercially available solutions.
- Company：一般財団法人材料科学技術振興財団 MST
- Price：Other
